Nūhou

I ka holomua ʻana o nā kaʻina hana semiconductor i 3nm, 2nm a ma ʻō aku, he mea nui nā Constant Temperature a me Humidity Chambers no ka hōʻoia huahana piha-kahe, e hāʻawi ana i nā kūlana kaiapuni paʻa a pololei mai R&D a i ka hana nui ʻana.
Me ka mana kiʻekiʻe o ka pololei (± 2% pololei o ka haʻahaʻa RH) a me ka mālama ʻana i nā kūlana ISO 17025, hōʻoia kēia mau keʻena i nā hopena hoʻāʻo kūlike a hiki ke hana hou ʻia, e hoʻopau ana i ka hoʻopilikia ʻana o ke kaiapuni i ka hōʻoia hana.

Hoʻohana nui ʻia i ka hana ʻana o ka wafer semiconductor a me ka hoʻāʻo ʻana i ke ahi, hoʻohālike lākou i nā wahi hana maoli a me nā wahi mālama e hōʻoia i ke kūpaʻa o nā ʻāpana, ʻike mua i nā hemahema hiki ke loaʻa, a pale i ka hōʻino ʻana o ka hana.

Hoʻolako ʻia me nā mana akamai maʻalahi e hoʻohana ai, ka nānā ʻana i ka ʻikepili manawa maoli, a me ka hoʻolālā liʻiliʻi e mālama ai i ka ikehu, hoʻohui pono lākou i nā kahe hana hana aunoa, e hōʻemi ana i nā kumukūʻai hana me ka mālama ʻana i ka pono kiʻekiʻe.

He kī kēia mau keʻena i ka mālama ʻana i ka maikaʻi o ka huahana semiconductor, e hāʻawi ana i ka hōʻoia pololei hilinaʻi no nā R&D hale hana a me ka hana nui, e kōkua ana i nā ʻoihana e hoʻokūkū ma ka mākeke kiʻekiʻe.